The interaction of light with matter offers an invaluable tool to characterize the properties of materials and, at the same time, can be exploited for applications in optical communications, data storage, or sensing.
Our FErroelectric/DiElectric laboratory is specially designed to characterize all kind of functional properties of ferroelectric and multiferroic thin films.The following characterizations can be performed:
- Impedance spectroscopy Z(w), for w<1MHz, look in I. Fina, et al., Thin Solid Films 518, 4710(2010).
- Capacitance and loss tangent measurements as a function of frequency (between 5Hz and 13 MHz) and voltage up to 35 V, look in D. Gutiérrez, et al.,. Physical Review B 86, 125309 (2012).
- Hysteresis loops: I(V) and P(E) for applied voltages up to 500 V and 10 kHz, look in I. Fina, Journal of Applied Physics 109, 074105 (2011).
- I-V curves for the purpose of leakage characterization, look in M. Scigaj, et al., Scientific Reports 6, 31870 (2016).
- Pyrocurrent measurements, with the help of a Keithley 617 electrometer, look in I. Fina, et al.,Physical Review B 88 (10), 100403 (2013)
- Photoelectric characterization with a set of lasers (1500 mW/cm2) with different wavelengths (405 – 638 nm), look in F. Liu, et al., Advanced Electronic Materials 1, 1500171.