Chemical solution route to self-assembled epitaxial oxide nanostructures
X. Obradors, T. Puig,* M. Gibert, A. Queraltó, J. Zabaleta and N. Mestres
Chem. Soc. Rev., 2014,43, 2200-2225
Month: September 2014
Ziliang Li, a new PhD student at SUMAN
Zilian Li from China, after obtaining his master’s degree of Materials Science in University of Science and Technology of Beijing, joined SUMAN group to start his PhD thesis on “Fast growth of nanostructured coated conductors from chemical solutions” under the supervision of Dr. Mariona Coll and Prof. Xavier Obradors. Welcome Ziliang!
Jose Antonio’s final degree project (Nanoscience and Nanotechnology)
Jose Antonio Peña, student on the last year of Nanoscience and Nanotechnology degree (UAB), has joined SUMAN group to do the final year degree project on “Growth of YBCO layers on CZO buffered substrates” under the supervision of Dr. Cornelia Pop.
Welcome Jose Antonio!
Low Temperature Stabilization of Nanoscale Epitaxial Spinel Ferrite Thin Films by Atomic Layer Deposition
M. Coll, J. J. Montero, J. Gazquez, K. Nielsch, X. Obradors and T. Puig
Advanced Functional Materials, 24, 5368-5374 (2014)
In this work heteroepitaxial stabilization with nanoscale control of the magnetic Co2FeO4phase at 250 °C is reported. Ultrasmooth and pure Co2FeO4 thin films (5–25 nm) with no phase segregation are obtained on perovskite SrTiO3 single crystal (100) and (110) oriented substrates by atomic layer deposition (ALD). High resolution structural and chemical analyses confirm the formation of the Co-rich spinel metastable phase. The magneto-crystalline anisotropy of the Co2FeO4 phase is not modified by stress anisotropy because the films are fully relaxed. Additionally, high coervice fields, 15 kOe, and high saturation of magnetization, 3.3 μB per formula unit (at 10 K), are preserved down to 10 nm. Therefore, the properties of the ALD-Co2FeO4 films offer many possibilities for future applications in sensors, actuators, microelectronics, and spintronics. In addition, these results are promising for the use of ALD compared to the existing thin-film deposition techniques to stabilize epitaxial multicomponent materials with nanoscale control on a wide variety of substrates for which the processing temperature is a major drawback.
Institut de Ciència de Materials de Barcelona ICMAB CSIC
